The high purity titanium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc., it can also be used in wear-resistant materials, high temperature, and corrosion resistance, High-end decorative supplies and other industries.

Equipped with advanced magnetron sputtering coating, which uses an electron gun system to emit and focus electrons on the material being plated so that the atoms sputtered follow the principle of momentum conversion and detach from the material with higher kinetic energy. Compared with products on the market, our high-purity sputtering target adopts sputtering technologies for thin film materials. It uses the ions generated by the source to accelerate the concentration in a vacuum to form a high-speed energy ion beam, which bombards the solid surface, and the ions exchange kinetic energy with the solid surface atoms.

The higher the purity of the target, the better the performance of the film. Our high purity titanium sputtering target can meet the purity of 99.995%.

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